Tag: sputtering target
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All Glow, No Go: Troubleshooting Cold Cathode Sputtering
This guide addresses common causes of non-depositing plasma in cold cathode sputtering systems, highlighting five key issues: improper grounding, target erosion, low power, gas flow errors, and weak magnets. Each problem is explained with symptoms and solutions, emphasizing the importance of maintenance and monitoring to ensure optimal sputtering performance.
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Selecting the Right Sputtering Target Material for SEM Imaging
Selecting the appropriate coating material for SEM applications depends on factors such as the sample nature and intended use. Different materials offer different benefits, with gold being commonly used for non-conductive samples due to its efficiency and low work function. Other options like platinum, palladium, and silver also have specific advantages and drawbacks. Be mindful…